Abstract
The multiangle ellipsometry method was used to study phase-structural transformations occurring during thermal annealing of vacuum-deposited SiOx films in air. The analysis of the experimental results carried out with a set of optical models that take into account nonuniformity and anisotropy made it possible to obtain data about the impact of the competitive processes of phase decomposition and oxidation of SiOx films into macro- and microstructures of systems formed in the annealing temperature range from 650 to 1000 °C.
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