Electrostructural and morphological features of etch pits in boron-doped HPHT-diamond single crystals and multisectoral plates

Abstract

Morphological, structural, and nano-electrical features of the growth defects and sectoral boundaries revealed by selective etching in synthetic boron-doped single crystals of diamond (BDD) and multisectoral plates are characterized by a set of scanning probe microscopy (SPM) methods, confocal micro-Raman, and micro-FTIR spectroscopy. Diamond single crystals were grown under high pressure and high temperature conditions (HPHT) in the FeAlBC system. Morphology of dislocation etch pits and micro-defect related pits/protrusions compared both on the growth facets and multisectoral plates cut parallel to the {110} facet of BDD single crystals. Ex situ AFM observation of the etched surface revealed non-homogeneously distributed pits and protrusions over the growth facets correlated with irregular macroscopic growth defects. There is a center-to-periphery gradient of dislocation density in multisectoral plates. The protrusions are homogeneously distributed over plates; some often decorate dislocation pits. Micro-Raman mapping on dislocation pits (boron-rich regions) decorated by low-boron content regions revealed crystalline imperfections in three dimensions, with apparent compressive/tensile strain. The defects were mainly electrically neutral under surface potential mapping by Kelvin probe force microscopy, opposite to the inter-sectoral boundaries having pronounced surface potential steps. The scanning spreading resistance microscopy shows resistivity variations at etching-reviled surface defects and sectoral boundaries if the appropriate DC bias is applied to the SPM tip.