ELECTROSTATIC DEPOSITION OF LARGE GRAINED POLYCRYSTALLINE SILICON FILMS FOR SOLAR CELL APPLICATIONS

Abstract

ABSTRACT Large grained (> 50 μm < 100 μm) poly crystalline silicon films have been formed using a patented electrostatic deposition method which utilizes charged panicle motion in an electric field. After deposition, the films are heat treated at varying times and temperatures in a programmable furnace maintained under a purified argon atmosphere Solar cells were fabricated using these large grained polycrystalline silicon films by sputtering pure gold as back contacts and using high quality silver paint as front contacts. The cells have shown efficiencies of 1.8% indicating that great potential exists for significant improvement.