Electrophysical properties of Co-, Cr-, Ni-based double-layer films at interdiffusion of atoms

Abstract

Electrophysical properties of double-layer structures consisting of the alternate Co and Ni layers or Co and Cr or Ni and Cr layers obtained in the vacuum of-lCMo -5 Pa were investigated. The size dependences of the temperature coefficient of the resistance (TCR) of the films were obtained experimentally and compared with microscopic and macroscopic theoretical models. The analysis shows that the main reason for the difference between theoretical and experimental data of TCR is the interdiffusion of atoms from one layer to anolher_and, in some cases, formation of intermediate layer.