Abstract

Wide and ultrawide bandgap semiconductors demonstrate exceptional performance due to their elevated energy bandgap. This characteristic results in breakdown electric fields surpassing those found in conventional silicon electronics by more than an order of magnitude. Furthermore, the high energy bandgap offers distinctive advantages, including enhanced efficiency, drift velocity, increased voltage blocking, and high-frequency switching, making these semiconductors crucial in pushing the boundaries of electronic technology. Gallium Oxide and Silicon Carbide, distinguished by their unique properties, contribute significantly to the advancement of power electronics. Gallium Oxide, with its wide bandgap of 4.6 – 4.9 eV and excellent thermal stability, stands out for its ability to handle high electric fields and temperatures. Silicon Carbide, on the other hand, boasts a robust combination of high thermal conductivity and a wide bandgap of 3.26 eV, making it well-suited for high-power and high-temperature applications. The combination of these two materials in a heterojunction holds promise for the development of high-performance power devices. In this study, we propose a novel high breakdown voltage Silicon Carbide (SiC)/ Gallium Oxide(Ga2O3) heterojunction diode through TCAD Sentaurus. We present a comparative study of the breakdown voltage and electric field across different heterojunction lengths and under various doping concentrations. The investigated heterojunction showcases a high breakdown voltage of 1899V, making it a promising candidate for advanced power electronics applications. Furthermore, simulation results revealed a significant increase in the breakdown voltage of the SiC/Ga2O3 heterojunction, escalating from 1899 V to 4864 V when extending the heterojunction length. Improved specific ON resistance (RON, sp) and Baliga figure-of-merit (BFOM) will also be presented.

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