Electronic interaction of slow hydrogen, helium, nitrogen, and neon ions with silicon

Abstract

We investigate the electronic excitation of silicon by hydrogen, helium, nitrogen, and neon ions for ion energies ranging from several tens to a few hundred kiloelectronvolts. Experiments are carried out in transmission geometry using a time-of-flight medium energy ion scattering system. The targets are self-supporting, single-crystalline Si (100) foils with nominal thicknesses of 50 and 200 nm. Stopping cross-sections (SCSs) are derived and compared with datasets available from the literature and predictions from theory. The results for H projectiles reveal good agreement with literature datasets, within quoted uncertainties. For He projectiles, the results show good agreement with most of the literature data. For N ions, higher values than reported in the literature are measured. For Ne, where literature data are scarce, we extend the velocity regime for which data exist by a factor of two toward higher velocities. The electronic SCS is found to be proportional to ion velocity for all impinging ions, for velocities below the Bohr velocity $(v<{v}_{0})$. Comparison with theoretical predictions for a homogeneous free electron gas indicates strong contributions of local energy loss processes different from those expected for electron-hole pair excitation in binary collisions for all ions different from protons.