Abstract
Plasma-material interaction is examined in an electronegative warm plasma under secondary electron emission from the wall. The sheath formed during the interaction is evaluated and its thickness is compared for three different plasmas (C60plasma, Oxygenplasma and CF4,plasma) and the sheath thickness is found to be maximum in C60plasma and minimum in Oxygenplasma. The sheath potential, floating potential, and sheath thickness decrease when the secondary electrons are present in larger number. The density of secondary electrons increases with higher number of the negative ions at the sheath edge as well as inside the sheath for various values of density of multi-charged negative ions.
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