Abstract
A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a `visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.
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