Abstract
H 2 adsorption of evaporated clean and H 2-exposed aluminum films is investigated by using the electron-stimulated desorption (ESD) method. A strong H + ESD signal is observed on a freshly evaporated aluminum surface which is clean according to previously proposed cleanliness criteria. An increased H + yield on H 2 exposure is also observed. However, the increasing rate of H + emission could be directly correlated with small increases in H 2O partial pressure during H 2 exposure. It is proposed thatthe oxidation of aluminum by water vapor and subsequent adsorption of H 2 or water is the primary process of the enhanced high H + yield during H 2 exposure.
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