Abstract
The performance of a high-voltage variable-shape electron beam lithography machine has been investigated for tungsten hairpin cathodes, and for pointed and flat-top sintered LaB 6 cathodes. Differences in edge resolution were observed which can be attributed to source energy spread. A compact retarding-field analyzer fitted to the column was used to measure energy spread in the probe for various operating conditions and results were compared with Monte-Carlo simulations of the column performance.
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