Abstract
The contribution of an electron beam exposure tool to positive resist profiles has been investigated experimentally and with two‐ and three‐dimensional modelling. Listed in decreasing importance are: spot placement error > beam defocus > beam tilt (trapezoidal energy distribution across and/or down the length of a line in the resist) > beam noise (variation of energy from spot to spot down the length of a resist line, as well as Gaussian noise within the same spot). These tool contributions to resist profile have been characterized in two resists: a linear PMMA derivative and a highly nonlinear novolac resist that exhibits a long induction time before developing.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
