Electron beam lithography on cylindrical roller

Abstract

We developed a nano-structure fabrication technology over a cylindrical roller using electron beam lithography (EBL) and a specimen rotation apparatus. The high-resolution patterning is done on a cylindrical roller specimen and it is achieved by controlling the thickness of photo-resistance (PR) and dosage of the electron beam (EB). We successfully obtained homogeneous arrays of one-third circle grating with a nano-scale width 100 nm and a large area of 6 × 3.5 mm square. Couples of the “ITRI” character marks were also fabricated. The stitching control was accurately derived using the in-house made two-axis rotation system, which provides the smallest stitching of about 1.6 μm. The minimum feature size of 100 nm over the cylindrical roller is demonstrated. Moreover, the Nicole template with “ITRI” character pattern on the cylindrical roller was also successfully made, of which thickness is about 80 nm.