Abstract
Electron beam (EB) irradiation experiments on Au/ITO and ITO/Au/ITO multilayer thin films are reported. The structure and the optical-electrical properties of the samples were investigated by X-ray diffraction, atomic force microscopy, four-point probe resistivity measurement system, and UV–vis-NIR double beam spectrometer, respectively. Those results show that the EB irradiation has the effects of improving the crystalline of samples, widening the optical band gap of both thin films, reducing the sheet resistance, and improving the transmittance of samples.
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