Abstract

Poli(tiofeno) (PT) foi estudado atraves de tecnicas de dessorcao estimulada por eletrons (ESID) e fotons (PSID) acopladas a espectrometria de massas por tempo-de-voo (TOF-MS), a fim de investigar a resposta desse polimero, quando submetido a feixes de eletrons e fotons. Ions atomicos de enxofre e suas contribuicoes isotopicas foram claramente identificados. A intensidade maxima das curvas de rendimento ionico de ESID foi medida para todos os ions em cerca de 900 eV, estao relacionadas com o processo de ionizacao do carbono 1s e explicadas em termos do processo Auger. O estudo da influencia de eletrons secundarios no processo de desorcao foi tambem realizado, o que e altamente importante, uma vez que envolvem niveis mais baixos de energia, afetando as propriedades de interesse de materiais fotovoltaicos. A analise de TOF-PSID de filmes de PT com diferentes espessuras mostrou um aumento na eficiencia da dessorcao de especies mais pesadas, como C3HS + . Este resultado foi atribuido aos eletrons secundarios originados nas camadas internas do material. Poly(thiophene) (PT) was studied by the electron (ESID) and photon (PSID) stimulated ion desorption techniques coupled with time-of-flight mass spectrometry (TOF-MS) in order to investigate the response from this semiconducting polymer when submitted to electron and photon beams. Atomic sulfur ions and its isotopic contributions could be clearly identified. Maximum intensity in the ESID ion yield curves was measured for all ions around 900 eV, which may be related to carbon 1s ionization and explained in terms of the Auger stimulated ion desorption process. The study of the influence of secondary electrons for the desorption process was also investigated, which is highly important, since they involve lower energy levels, affecting the properties of interest of photovoltaic materials. TOF-PSID analysis on PT films with different thicknesses showed an increase in the efficiency to desorb higher mass species, like C 3HS + . This result was attributed to the role of secondary electrons originated in the inner layers of the material.

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