Abstract
Electrodeposition of functional coatings on aluminum electrodes in aqueous solutions often is impeded by the corrosion of aluminum. In the present work it is demonstrated that electrodeposition of vanadium oxide films on nanostructured aluminum substrates can be achieved in acidic electrolytes employing a novel strategy in which a thin interspacing layer of manganese oxide is first electrodeposited on aluminum microrod substrates. Such deposited films, which were studied using SEM, XPS, XRD, and surface enhances Raman scattering as well as chronopotentiometry, are shown to comprise a mixture of vanadium oxidation states (i.e. IV and V). As this all-electrochemical approach circumvents the problems associated with aluminum corrosion, the approach provides new possibilities for the electrochemical coating of nanostructured Al substrates with functional layers of metal oxides. The latter significantly facilitates the development of new procedures for the manufacturing of three-dimensional aluminum based electrodes for lithium ion microbatteries.
Highlights
The continuous miniaturization within the field of electronics has created increased interest in the modification of nanostructured substrates and electrodeposition has emerged as a promising technique for straightforward and cost-effective preparation of threedimensional (3D) structures, allowing the realization of nanostructures with functional layers.[1,2] The fact that the fabrication and coating of complex 3D nanostructures can be carried out at low temperatures with precise control differentiates electrochemical deposition from other thin film deposition techniques including physical vapor deposition (PVD), chemical vapor deposition (CVD) and atomic layer deposition (ALD).[1]
Since no vanadium oxide could be found on the aluminum surface after the oxidation the present results clearly show that it is difficult to deposit vanadium oxide on aluminum electrodes under the present experimental conditions
The presence of vanadium oxide, containing a mixture of VV and VVI, on top of a thin layer of manganese oxide is supported by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), EDS and Raman spectroscopy data
Summary
The continuous miniaturization within the field of electronics has created increased interest in the modification of nanostructured substrates and electrodeposition has emerged as a promising technique for straightforward and cost-effective preparation of threedimensional (3D) structures, allowing the realization of nanostructures with functional layers.[1,2] The fact that the fabrication and coating of complex 3D nanostructures can be carried out at low temperatures with precise control differentiates electrochemical deposition from other thin film deposition techniques including physical vapor deposition (PVD), chemical vapor deposition (CVD) and atomic layer deposition (ALD).[1]. Since this most likely is due to the aluminum corrosion taking place in the acidic solutions generally employed in the depositions,[21,22,23,24] it is clear that the development of an all-electrochemical process for the manufacturing of vanadium oxide coated 3D aluminum substrates represents a significant challenge.
Sign-in/Register to view highlights & summary 
Published Version (
Free)
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call