Electrodeposition of Silicon (Si) from ionic liquid at room temperature (for EWT solar cell)

Abstract

Silicon is one of the important semiconductors widely used in Solar PV cells. In recent years, back contact solar cells such as EWT Solar cell are innovated to enhance photo current efficiency. Currently for Solar cell application silicon films are deposited with methods such as Chemical Vapor Deposition (CVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD). The major disadvantages of above mentioned techniques are involved cost, involved complexity, material consumption and slow rate of deposition at large scale. In case of EWT solar cell the holes on front side are fabricated using expensive technologies such as laser drilling and dicing saw. Electro deposition is elegant method compare to all other above mentioned methods because it offers less complex setup at very low cost.. In present study, porous silicon (Si) has been successfully electrodeposited using ionic liquid based electrolyte namely BMimTf2N at room temperature. The porous Si structure can be used in EWT solar cell.