Electrodeposited MoS2 film on nickel foam as a binder-free electrode for supercapacitors

Abstract

In this work, MoS2 was successfully deposited on Ni foam (NF) by a simple one-step electrochemical deposition method. MoS2 were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), X-ray photoelectron spectrum (XPS) and energy dispersive spectrometer (EDS). XRD and FESEM results show that MoS2 is an amorphous film structure. The electrochemical properties of the MoS2 electrode have been studied in detail via cyclic voltammetry (CV), galvanostatic charge-discharge (GCD) and electrochemical impedance spectroscopic (EIS) technology, respectively. The MoS2/NF binder-free electrode provides a special capacitance of 210 F/g at a constant discharge current density of 1 A/g. When the current density increases five times, the specific capacitance can still maintain 51.74% of the initial capacitance. In addition, after 1000 cycles at 3 A/g, the capacitance retention of the MoS2 electrode still retained 79.4%.