Abstract
Nonvacuum electrodeposition was used to prepare biaxially textured Ni coatings on Ni-W substrates. The samples were characterized by X-ray diffraction (including θ/2θ, pole figures, omega scans, and phi scans), and atomicforce microscopy. Pole-figure scans show that electrodeposited (ED) Ni on textured Ni-W (3 atom %) is 99.3% cube textured. Full width at half-maximum values of the ω scan and Φ scan of the electrodeposited Ni layers were comparable to the Ni-W base substrates, indicating good biaxial texturing. The buffer structures were completed on these types of seed ED-Ni layers by pulsed-laser-deposited (PLD) CeO 2 /YSZ/CeO 2 . We obtained a critical current density of 1.8 MA/cm 2 at 75.2 K in 600 Gauss magnetic field for PLD YBa 2 Cu 3 O 7 - δ /CeO 2 /YSZ/CeO 2 /ED-Ni/Ni-W.
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