Abstract
Meso-structured lamellar manganese oxide thin films were prepared electrochemically using an anodic potentiostatic deposition method in a dilute surfactant solution of sodium dodecyl sulfate. The effects of the deposition potential, surfactant type, surfactant concentration and concentration of manganese ions on the electrochemical preparation of the meso-structured manganese oxide thin films were examined. Meso-structured lamellar MnO 2 was formed only in the solution containing 0.1 M MnSO 4 and 5 wt.% SDS. The UV/ozone treatment could successfully remove most of the surfactant template under non-thermal conditions without destroying the as-synthesized lamellar meso-structure of MnO 2. Small-angle XRD and HRTEM confirmed the meso-structured lamellar biphase with a repeat unit of 3.75 and 3.01 nm, respectively.
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