Abstract
In summary, a new method for the electrochemical preparation of mesoporous alloy of Cu/Cu2O film was introduced. In terms of hierarchical order structure, the best results were achieved using low concentration of the anionic surfactant SDS (<10 wt.%). Through XRD, TEM, SEM and energy spectrum analysis, the film has been characterized as a mesoporous Cu/Cu2O film with hexagonal mesophase and high-quality atom-scale cubic crystalline framework. In combination with the results, this suggests that the growth of the film is accomplished through a deposition process of copper ions-coated rod-like micelles.
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