Abstract
We present a new approach to fabricate arrays of silver nanoparticles (SNPs) on predefined positions by means of electrochemical deposition (ECD) combined with nanoimprint lithography (NIL). The SNPs arrangement, especially the density can be tuned by varying the pattern design and the preparation conditions. By this approach, various arrays of SNPs with feature size down to submicrometer can be fabricated over several square centimeters on one substrate. The SNPs arrays can be readily extended to other conductive substrates, which have potential applications in detecting and sensing fields, such as surface-enhanced raman scatter.
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