Abstract
Aluminum and aluminum-manganese alloys were electrodeposited on low carbon steel substrates from 1-ethyl-3-methyl imidazolium chloride with AlCl3 and MnCl2 salts. We could show that the applied current density influenced drastically the morphology of the deposits. More uniform and smooth deposits were obtained at current densities above 6 mA/cm², while at lower current densities the morphology of the deposits was in the form of plates, which grown parallel to the substrate. The morphology and the composition of the deposited films were characterized by SEM and EDX. X-Ray diffraction (XRD) measurements showed that the Al and some of the AlMn layers have a crystalline structure. The thicknesses of the deposits, and in the case of the AlMn their composition, were estimated from X-Ray Fluorescence measurements. The corrosion behavior of the layers having different thicknesses (up to 30 µm) was studied by electrochemical impedance spectroscopy and linear polarization in 3.5% NaCl solution. We could show that the AlMn coatings had superior corrosion resistance compared to the pure Al layers.
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