Abstract
The dissolution of Co2Si in 0.5 M H2SO4 containing 0–100 mM fluoride was studied electrochemically, by electron microscopy, and X-ray microanalysis. In the base solution, the anodic corrosion resistance of Co2Si silicide was two to four exponents higher than that of cobalt. During the anodic polarization of Co2Si, the selective dissolution of cobalt takes place concurrently with the oxidation of silicon to SiO2. The process is controlled by the diffusion of Co in the intermetallic compound and the diffusion of oxidized Co in the superficial layer of hydrated SiO2.
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