Electrical properties of epitaxial tungsten films grown by laser ablation deposition

Abstract

An investigation was made of electrical properties of tungsten films of thickness in the range of 30–140 nm, grown by laser ablation deposition in ultrahigh vacuum on [1̄012] sapphire substrate. From the data on the size effect and the temperature dependence of the resistivity r, supported with reflection high energy electron diffraction measurements, we find that the films, deposited onto clean substrates kept at temperatures higher than 500 °C, grow epitaxially with high quality crystalline structure. The effective electron mean free path changes from 300 to 1400 nm while the residual resistance ratio RRR=r (295 K)/r (4.2 K) changes from 7 to 35. At low temperatures we find the temperature dependent part ρ(T)≊ATn, with A=1.56 mΩ cm K−n, n=3–3.4 for the temperatures T<20 K. From the fit of the data to the equations of the classical size effect theory it was found that the main source of electron scattering at helium temperatures is interface scattering with a specular coefficient q≊0.3 and the bulk electron mean free path l∞ (4.2 K)∼200 μm, which is up to 103 times larger than the film thickness.