Efficient hydrogen evolution performance of phase-pure NiS electrocatalysts grown on fluorine-doped tin oxide-coated glass by facile chemical bath deposition

Abstract

The production of hydrogen, the future fuel, on stable, efficient, and robust electrocatalysts represents an attractive approach for the conversion and storage of carbon-free energy resources. In this study, earth-abundant nickel sulfide (NiS) electrocatalyst were grown on fluorine-doped tin oxide (FTO) substrate by a simple and cost-effective chemical bath deposition for hydrogen evolution reaction (HER). Energy dispersive X-ray analysis and X-ray photoelectron spectra indicated the presence of highly pure NiS. The HER performance of the catalyst was examined in alkaline solution (1.0 M NaOH; pH = 13.5). Notably, NiS film prepared at 100 °C demonstrated superior HER activity with an overpotential of 290 mV to afford a current density of 10 mA/cm2 and a Tafel slope of 143.4 mV/dec which are among the promising results obtained for sulfide-based HER electrocatalysts. The catalyst exhibited 100% faradaic efficiency and electrochemical stability which indicate its potential as noble-metal-free HER electrocatalyst.