Abstract
AbstractThe ability to optimise the performance of today's opto‐electronic circuits over a range of operational parameters and fabrication tolerances is foremost in the designer's mind. The ability to investigate the effects of tolerancing and integration upon device performance over a range of wavelengths is highly desirable for their successful exploitation. The spectral index (SI) method is a well‐established method traditionally used for the analysis of the modal properties of semiconductor rib waveguides. In this paper the efficiency and accuracy of the SI method is exploited for the first time in a scattering‐matrix approach to the analysis of complex integrated optical circuits. The SI approach yields highly accurate results with minimal computational effort. © 2003 Wiley Periodicals, Inc. Microwave Opt Technol Lett 38: 68–73, 2003
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