Abstract

In this paper, a gradient electron blocking layer (GEBL) is introduced to improve efficiency of deep‐ultraviolet light‐emitting diodes (DUV‐LEDs). Various structures of DUV‐LEDs are simulated to determine the energy band diagram variation and carrier injection mechanism resulting from the insertion of the GEBL. The simulation results show the improved electron and hole transport behavior in AlGaN multi quantum wells (MQWs). Especially, the injection efficiency of holes is improved with the increasing number of GEBL steps, which lead to the enhancement of internal quantum efficiency (IQE). The DUV‐LED structures with GEBL are grown in a high‐temperature metal‐organic chemical vapor deposition (HT‐MOCVD) system. Electroluminescence (EL) spectra show that the emission intensity at a wavelength of 280 nm from a DUV‐LED with a 12‐steps EBL is about 2.3 times that from a DUV‐LED with a single EBL.

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