Abstract
The effects of water on 2-mercaptobenzothiazole (2-MBT) film pre-formed on copper at low pressure and room temperature was investigated in situ by X-ray photoelectron spectroscopy. Upon exposure to water vapour at 5 × 10−6 mbar, the 2-MBT molecules not directly bonded to copper desorb, until only one monolayer remains adsorbed. Further exposure leads to cleavage of the bond between exocyclic sulphur and copper, whereas nitrogen remains bonded to copper. Dissociative adsorption of water is observed, without copper oxidation for exposure up to 3 × 106 L. This work brings new molecular scale insight into corrosion inhibition mechanisms in water-containing environments.
Highlights
Given the extensive use of copper in industrial and civil sectors, its corrosion degradation plays a significant role in economics and safety, rising the importance of corrosion protection
The sample was exposed to water vapour at low pressure and room temperature (RT), and the surface was characterized in situ by X-ray photoelectron spectroscopy (XPS)
In order to allow a precise control of the interaction mechanisms, a surface science approach on a model system was employed, with exposure to water vapour in gaseous phase at low pressure and RT of Cu(111) single crystal surface pre-covered by a well-characterized 2-MBT layer, and in situ surface chemical analysis by XPS
Summary
Given the extensive use of copper in industrial and civil sectors, its corrosion degradation plays a significant role in economics and safety, rising the importance of corrosion protection. The use of corrosion inhibitors is considered as one of the most effective ways to protect copper from corrosion The molecule was found to coordinate with the copper substrate through sulphur and nitrogen atoms, leading to the formation of a protective barrier organic film on copper surface, preventing the metal from further degradation. For these studies carried out directly in liquid phase, it is difficult to control and follow each step of interaction between the inhibitor, copper and water. Surface contamination is a problem for ex situ analysis
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