Abstract
The effects of water on 2-mercaptobenzothiazole (2-MBT) inhibitor layers pre-deposited on copper were investigated in situ by X-ray Photoelectron Spectroscopy.Upon exposure to water vapour at low pressure (5x10-6mbar), the 2-MBT molecules that are not directly bonded to copper desorb, until only one monolayer remains adsorbed on the metal surface. Further exposure leads to cleavage of the bond between exocyclic sulfur and copper, whereas nitogen remains bonded to Cu. Dissociative adsorption of water is then observed. No oxidation of copper is observed for exposures up to 3x106L.This work brings new molecular scale insight into the corrosion inhibition mechanisms by adsorbed organic molecules.
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