Abstract
In this study, We analyzed the influence of texturing size and reflectivity on various texturing processe. To accomplish this, we produced solar cells with various textured surfaces. The method we used to produce these cells includedmethods such as anisotropic chemical etching (texturing size of about 4 μm using a mixed solution of IPA and KOH, reactive ion etching (texturing size of about 0.2 μm, and Ag catalyzed etching (texturing size of about 90 nm). The solar cells with an Ag-catalyzed etching textured structure showed the lowest efficiency of 11.87%, with the highest series resistance of 1.32 Ω. In the case of anisotropic chemical etching, the solar cell had the best efficiency of 17.84%, with the lowest series resistance. This means that the electrodes and silicon surfaces were not well-connected with the nano-sized textured silicon surface. The results revealed that conventional Ag paste at an average of 1.6 μm is unsuitable for nano-sized textured Si solar cells.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
