Abstract
In this study, radio frequency magnetron sputtering was used to deposit indium-doped zinc oxide (IZO) films with varying deposition time on glass substrates. The structural, optical, and resistivity properties of IZO films were investigated with field emission scanning electron microscope, X-ray diffraction patterns, UV–visible spectroscopy, and Hall-effect analysis. XRD analysis on IZO films showed that only the (002) diffraction peak was observable, indicating that the IZO films showed a good c-axis orientation perpendicular to the glass substrates. As the deposition time of IZO films increased from 30 to 90 min, the thickness increased from 237 to 389 nm, the grain size increased from 12.3 to 87.6 nm, and the resistivity decreased from 9.08 × 10−3 to 2.85 × 10−3 Ω-cm. The transmittance was found to slightly decrease with the increasing thickness of IZO films.
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