Abstract
Indium-doped zinc oxide (IZO) films were deposited on (11-20) sapphire substrates at 300°C by atomic layer deposition (ALD) using diethyl-zinc (DEZn),trimethyl-indium (TMIn) and nitrous oxide (N2O). The optical, structural and conductive properties of the ALD-grown IZO films were characterized by optical transmission spectroscopy, x-ray diffractometry (XRD), field-emission scanning electron microscopy (FESEM), and Hall measurements. The atomic percentages and chemical states of ALD-grown IZO films were also analyzed by x-ray photoelectron spectroscopy (XPS). It was found that In-doping tended to enhance conductivity and transmittance of the IZO film. Under certain conditions, ALD-grown IZO films exhibit more than 90% optical transmittance in the visible spectra with resistivities being in the range of high 10^-4 Ω-cm.
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