Effects of thermal annealing on the optical properties of Ar ion irradiated ZnS films

Abstract

Abstract Ar-ion-implantation to a dose of 1×1017 ions/cm2 was performed on cubic ZnS thin films with (111) preferred orientation deposited on fused silica glass substrates by vacuum evaporation. After ion implantation, ZnS films were annealed in flowing argon at different temperatures from 400 to 800 °C. The effects of ion implantation and post-thermal annealing on the structural and optical properties of ZnS films were investigated by X-ray diffraction (XRD), photoluminescence (PL) and optical transmittance measurements. XRD reveals that the diffraction peaks recover at ∼500 °C. The optical transmittances show that the bandgap of ZnS films blueshifts when annealed below 500 °C, and redshifts when annealed above 500 °C. PL results show that the intrinsic defect related emissions decrease with increasing annealing temperature from 400 to 500 °C, and increase with increasing annealing temperature from 500 to 800 °C. The observed PL emissions at 414 and 439 nm are attributed to the transitions of Zni→VZn and VS→VBM, respectively.