Abstract

We studied the effects of the electrical conductivity and orientation of silicon substrate on both catalytic Fe thin film and the structure and morphology of multi-walled carbon nanotube (MWNT) grown by low-pressure chemical vapor deposition. Both p-type Si(100) and Si(111) substrates with three different doping concentrations (high, low, undoped) were used to evaluate the formation of catalytic nanoparticles and the growth of MWNTs. The morphology of catalytic nanoparticles such as size and density was characterized by field-emission scanning electron microscopy, Cs-corrected energy-filtered transmission electron microscopy, and X-ray photoelectron spectroscopy. Structural characteristics of MWNTs grown on different combinations of silicon substrate orientation and electrical conductivities (σ) were also systematically analyzed. Based on the experimental results, growth modes of MWNTs could be controlled by choosing an appropriate combination of σ and orientation of Si substrates.

Highlights

  • A large number of experimental parameters for multiwalled carbon nanotubes (MWNTs) grown by chemical vapor deposition (CVD) have been investigated including the type of thickness of catalytic metal films [1,2], the substrate temperature [3,4], the ammonia gas flow rates [5,6], and supporting substrate, etc. [7,8]

  • We report the effects of σ and orientation of the silicon substrate on the growth of MWNTs by thermal CVD

  • In this study, we report the effects of the orientation and electrical conductivity of silicon substrates on the synthesis of MWNTs by thermal CVD

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Summary

Introduction

A large number of experimental parameters for multiwalled carbon nanotubes (MWNTs) grown by chemical vapor deposition (CVD) have been investigated including the type of thickness of catalytic metal films [1,2], the substrate temperature [3,4], the ammonia gas flow rates [5,6], and supporting substrate, etc. [7,8]. A large number of experimental parameters for multiwalled carbon nanotubes (MWNTs) grown by chemical vapor deposition (CVD) have been investigated including the type of thickness of catalytic metal films [1,2], the substrate temperature [3,4], the ammonia gas flow rates [5,6], and supporting substrate, etc. [7,8] Among those parameters, the control of the catalyst particles is one of the most important factors that determine the structure and morphology of MWNT properties such as lengths, diameters, and density [9-11]. We investigated the effect of the electrical conductivity of the Si(100) substrate on the control of the growth of MWNTs and found that as the electrical conductivity of the silicon substrate increased, the average

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