Abstract
SmCo 5 ( 0001 ) epitaxial thin films were prepared on Cu(111) underlayers heteroepitaxially grown on Al2O3(0001) single-crystal substrates by molecular beam epitaxy. The effects of substrate temperature and Cu underlayer thickness on the crystallographic properties of SmCo5(0001) epitaxial films were investigated. The Cu atoms of underlayer diffuse into the SmCo5 film and substitute the Co sites in SmCo5 structure forming an alloy compound of Sm(Co,Cu)5. The ordered phase formation is enhanced with increasing the substrate temperature and with increasing the Cu underlayer thickness. The Cu atom diffusion into the SmCo5 film is assisting the formation of Sm(Co,Cu)5 ordered phase.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
