Effects of Sputtering Time on Structure and Mechanical Properties of (AlCrNbSiTiV)N Coatings Deposited by High-Power Impulse Magnetron Cosputtering

Abstract

The effect of the sputtering time on the microstructure and mechanical properties of (AlCrNbSiTiV)N coatings deposited using high-power impulse magnetron sputtering (HiPIMS) and cosputtering with (AlCrNbSiTiV) equimolar and Ti targets has been studied. The surface morphology of the (AlCrNbSiTiV)N coatings was uniform and dense, with no peel-off or microcracks, and the films demonstrated complete attachment to the substrate. The (AlCrNbSiTiV)N films had a single face-centered cubic phase. An increase in the sputtering time resulted in the deposition of larger grains on the surface of the film. The greatest (N2) and lowest (Al) concentration varied slightly for the (AlCrNbSiTiV)N films. The elements in the (AlCrNbSiTiV)N film exhibited homogeneous distributions throughout the depth, as measured by secondary-ion mass spectroscopy. The experimental results also revealed that a cutting tool coated with the film using a sputtering time of 30 min exhibited the minimum flank wear (11.7 μm) and surface roughness (Ra = 1.018 μm). Cutting tools coated with (AlCrNbSiTiV)N film for turning Ti-6Al-4V alloys will achieve better cutting quality and have a longer tool life.