Abstract
ZnO thin films have been successfully grown on the quartz substrate by RF magnetron sputtering technique. The effects of rapid thermal annealing (RTA) on the structural and optical properties has been investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence (PL) measurements. The structural defects of ZnO thin films were reduced during the RTA processes and the crystallinity was improved after the RTA treatments. It is also found out that RTA treatments can remarkably improve the ZnO crystallinity and enhance the UV emission in the wavelength range of 335 - 450 nm over the annealing temperature range of 600 - 800 degree.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
