Effects of plasma treatments, substrate types, and crystallization methods on performance and reliability of low temperature polysilicon TFTs

C.W Lin,H.C Lin,H.C Cheng,M.Z Yang,T.S Chao,L.J Cheng,T.Y Huang,C.C Yeh,C.Y Chang

doi:10.1109/iedm.1999.824157

Effects of plasma treatments, substrate types, and crystallization methods on performance and reliability of low temperature polysilicon TFTs

C.W Lin, H.C Lin + Show 7 more

https://doi.org/10.1109/iedm.1999.824157

Copy DOI

Publication Date: Dec 1, 1999

Citations: 19

#Effects Of Plasma Treatments #Effects Of Different Plasma Treatments + Show 8 more

Abstract
Full-Text PDF
Similar Papers

Abstract

A complete performance and reliability study on effects of different plasma treatments (NH/sub 3/ and N/sub 2/O), substrate types (oxidized silicon wafer and quartz), and crystallization methods (excimer laser annealing and solid phase crystallization) of low temperature polysilicon (LTPS, <600/spl deg/C) TFTs are reported. It is shown that devices made by different fabrication methods exhibit different degradation behaviors under various stressing conditions.

Full Text