Abstract
AbstractMagnetorheological finishing (MRF) is a main technology to achieve super smooth surfaces of ultra‐precision optics. Although the nanoscale abrasives in MRF fluid are agglomerated to various extents, such effects on material removal in MRF are seldom discussed. Herein, the agglomeration of the nanodiamond (ND) abrasive on material removal rate (MRR) of MRF is studied by both experimental and molecular dynamic simulation (MDS) pathways. The agglomeration degrees of ND abrasives are being characterized by the hydrodynamic scattering method. The number of removed atoms by a single agglomerated ND abrasive is calculated by the MDS. Then by using a novel active abrasive contact sites model, the simulated MRR of fused silica (FS) can be obtained. Theoretical calculated MRRs compare well with the experimental MRF results. This work provides an insight into controlled nanoscale material removal and atomic adhesion friction mechanism in MRF.
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