Abstract

Photochemical properties of photoinduced omega-bond dissociation in naphthyl phenyl ketones having a phenylthiyl moiety as a leaving group, p-(alpha-naphthoyl)benzyl phenyl sulfide (NBPS) and 4-benzoyl-1-naphthylmethyl phenyl sulfide (BNMPS), in solution were investigated by laser flash photolysis techniques. Both ketones were shown to undergo photoinduced omega-bond cleavage of the C-S bond to release the phenyl thiyl radical (PTR) at room temperature. Irrespective of excitation wavelengths of NBPS, a quantum yield (Phi(rad)) of the PTR formation was obtained to be 0.1, whereas that for BNMPS was found to depend on the excitation wavelength, i.e., absorption bands from the ground state (S0) to the excited singlet states, S3, S2, and S1 of BNMPS; Phi(rad)(S3) = 0.77 and Phi(rad)(S2) = Phi(rad)(S1) = 1.0. By using triplet sensitization of p-phenylbenzophenone (PBP), efficiencies (alpha(rad)) of the radical formation in the lowest triplet state (T1(pi,pi*)) of NBPS and BNMPS were determined to be 0 and 1.0, respectively. The agreement between Phi(rad)(S1) and alpha(rad) values for BNMPS indicates that the C-S bond dissociation occurs in the T1 state via the S1 state via a fast intersystem crossing from the S1 to the T1 state. The wavelength dependence of the radical yields upon direct excitation of BNMPS was interpreted in terms of the C-S bond cleavage in the S3 state competing with internal conversion from the S3 to the S2 state. The smaller value of Phi(rad)(S3) than those of Phi(rad)(S1) and Phi(rad)(S2) was proposed to originate from the geminate recombination of singlet radical pairs produced by the bond dissociation via the S3 state. Photoinduced omega-cleavage of NBPS was concluded to take place only in the S1(n,pi*) state. Difference in reactivity of omega-cleavage between the triplet states of NBPS and BNMPS was interpreted in terms of localized triplet exciton in the naphthoyl moieties.

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