Abstract
TiN/AlTiN multilayer coatings were deposited on tungsten carbide cutting tool by applying a direct current on a pulsed bias arc ion plating system. The effect of pulsed bias layer thickness on sample properties was investigated. The amount of grain size decreased with increasing layer thickness. The crystal structure of the coatings was determined using a D8 Advance Bruker X-ray diffractometer with CuKa (λ = 1.5405 Å) radiation. TiN/AlTiN multilayer coatings were crystallized with orientations in the (111), (200), (222), and (311) crystallographic planes, and the microstructure was enhanced with preferred orientation in the (111) plane. Compared with the substrate, all the specimens coated with TiN/AlTiN multilayer coatings exhibited better X-ray diffraction properties.
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