Abstract
GAZO/Ag/GAZO/Ag/GAZO transparent conductive multilayer films were deposited by facing-target sputtering (FTS) methods at room temperature. As-deposited multilayer thin films consisted of Ag metal thin film layers and transparent conductive GAZO thin film layers. The fabricated multilayer thin films have a low sheet resistance and a high transmittance in the visible range. As a result, the sheet resistance, average transmittance in the visible range, and FOM (figure of merit) of the fabricated multilayer thin film with optimal layer thicknesses (50/12/75/12/50nm) were 2.7Ω/sq, 82%, and 4.9×10−2Ω−1, respectively (T: 0.82, Rsh: 2.7Ω/sq).
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