Abstract
Ferroelectric materials have received significant attention as next-generation materials for gates in transistors because of their negative differential capacitance. Emerging transistors, such as the negative capacitance field effect transistor (NCFET) and ferroelectric field-effect transistor (FeFET), are based on the use of ferroelectric materials. In this work, using a multidomain 3D phase field model (based on the time-dependent Ginzburg–Landau equation), we investigate the impact of the interface-trapped charge (Qit) on the transient negative capacitance in a ferroelectric capacitor (i.e., metal/Zr-HfO2/heavily doped Si) in series with a resistor. The simulation results show that the interface trap reinforces the effect of transient negative capacitance.
Highlights
In recent decades, complementary metal-oxide-semiconductor (CMOS) technology improved consistent with Moore’s Law [1]
The negative interface charge shows that the negative capacitance (NC) region does not exist or lasts momentarily
We investigated the has effect of the interface-trapped charge on the transient negative capacitance
Summary
Complementary metal-oxide-semiconductor (CMOS) technology improved consistent with Moore’s Law [1]. Recent simulation work suggests that HfO2-based ferroelectric film has a representative behavior called nonpolar spacer [22]. To examine the impact of the interface-trapped charge, we ignored nonpolar spacer effects. To investigate the effect of the interface trap on transient NC, we resistance-ferroelectric capacitor (R-FEC) circuit using 3D phase field simulation (which is based on modeled a resistance-ferroelectric capacitor (R-FEC) circuit using 3D phase field simulation (which the time-dependent Ginzburg–Landau (TDGL) equation [22,23]). The impacts of the interface trap on transient negative capacitance were investigated not exist. The impacts of the interface trap on transient negative capacitance were using the phase field simulation.
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