Abstract
The effects of additive gases of hydrogen, nitrogen, and oxygen on the crystallographic and magnetic properties of sputtered (Co–Ni–Zr)/Cr thin film recording media have been studied. The results show that oxygen and nitrogen affect the coercive force more severely than hydrogen does. However, no significant changes in saturation magnetization are observed due to the introduction of additive gases during deposition. The in‐plane epitaxial growth of a Co–Ni–Zr alloy magnetic layer on a Cr underlayer is degraded due to surface oxidation of the Cr underlayer by oxygen introduction and is also degraded due to lattice expansion of the Cr underlayer by nitrogen introduction.
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