Effects of Hydrogen-Dilution on Opto-Structural Properties of Hot-wire CVD Grown a-Si:H/nc-Si:H Multilayer for Photovoltaics

Abstract

The multilayered thin film structure of amorphous silicon (a-Si:H) and nanocrystalline silicon (nc-Si:H) provides the possibility of bandgap tuning for fabrication of multijunction solar cells. This paper communicates a detailed analysis of optical and structural properties of a-Si:H/nc-Si:H multilayer thin films by hot-wire chemical vapor deposition at low hydrogen (H2) and silane (SiH4) flow rates. A set of multilayer films with 25 bilayers of a-Si:H/nc-Si:H are prepared using different hydrogen-dilution of SiH4 in the alternating nc-Si:H layers. The first and the second order Raman scattering studies reveal the presence of mixed phases of silicon in the nc-Si:H layers. Raman and XRD investigation of the films confirm the presence of different sizes of the silicon nanocrystals. The optical spectroscopic analysis instead of FTIR analysis of multilayer films is utilized uniquely to determine the hydrogen content in the a-Si:H/nc-Si:H multilayers and is related to the amorphous phase of the films. No significant change in hydrogen content is observed and the amorphous phase is found to decrease with increase in hydrogen dilution. Further, no quantum size effect (QSE) was observed due to the large growth time of nc-Si:H layers. Thus the experimental result shows that the bandgap of multilayer films decreases due to reduction in amorphous silicon phase, ineffective QSE and relative loss of hydrogen content.