Effects of H2/O2 mixed gas plasma treatment on electrical and optical property of indium tin oxide

Abstract

This study examined the effects of H2 and H2+O2 mixed gas plasma treatment on the properties of ITO films. The films were deposited on corning glass by RF magnetron sputtering under Ar and Ar/O2 mixed gas ambient. After a H2 plasma treatment, the ITO films showed an improved specific resistance due to the formation of oxygen vacancies acting as shallow donors, but showed quenched transmittance due to the formation of agglomerated metals on the surface. After an H2+O2 mixed gas plasma treatment, the specific resistance of the film was improved without deteriorating transmittance. The enhanced specific resistance by mixed gas plasma treatment was attributed to the formation of free electrons by the incorporation of H in the lattice.