Abstract
The influence of electrodes on antiferroelectricity and fatigue endurance of 15 nm thick Hf0.2Zr0.8O2 thin films has been studied by a metal–antiferroelectric–metal capacitor structure using TiN and W as electrodes. The W|Hf0.2Zr0.8O2|W capacitor shows significantly enhanced antiferroelectricity and better endurance compared to the capacitor using TiN as the electrode. Assisted by grazing incidence x-ray diffraction and scanning transmission electron microscopy, the different electrical properties are discussed based on the contents of different phases and the diffusion of oxygen from the thin film into electrodes.
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