Abstract
Abstract Rutile phase titanium dioxide (TiO2) thin films were grown on α-Al2O3 (100) substrates at different deposition temperatures (500–650 °C) by the metalorganic chemical vapor deposition method. The analyses of X-ray diffraction θ-2θ scan indicated that the deposition temperature had an obvious influence on the crystal quality of the TiO2 films. Single crystalline rutile TiO2 films can be obtained from a relatively low deposition temperature of 500 °C–600 °C, and the film grown at 550 °C exhibited the best crystallinity, for which the composition and epitaxial relationship were identified. The effects of deposition temperature on the deposition rate and optical properties of the films have been investigated in detail.
Published Version
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