Effects of annealing temperature on optical, morphological, and electrical characteristics of polyfluorene-derivative thin films on ITO glass substrate.

Abstract

The effects of postdeposition annealing temperature (125°C-200°C) toward optical, morphological, and electrical characteristics of poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-(1,4-phenylene)] end capped with dimethylphenyl group deposited on indium tin oxide glass substrates were investigated. Green and red-infrared photoluminescence emissions, originating from П-conjugation aggregates and keto-type defects did not attenuate the intensity of the blue emission peak. This suggested that the aggregates and defects might serve as local traps for radiative recombination. In samples annealed at 125°C-175°C, a decreasing optical energy gap (E(g)) that decreased barrier height as well as an increasing amount of traps have increased current conduction via thermionic emission and trap-assisted tunneling. Nonetheless, an acquisition of the largest E(g) and amount of traps testified that thermionic emission was dominating current conduction, surpassing trap-assisted tunneling in samples annealed at 200°C.