Abstract
Abstract The SnO thin films have been deposited on quartz glass substrates using an e-beam evaporation system at room temperature and different post-deposition thermal treatments have been carried out. In case of annealing in air, n-type polycrystalline SnO films are obtained after annealing at 300 °C and 400 °C, respectively. For the 500 °C annealed film, SnO2 phase is generated due to the strong oxidation. However, when annealed in vacuum, pure p-type polycrystalline SnO films are produced. The feasible and controllable methods of p- and n-type SnO films contributes to the development of high performance devices.
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